1.Sputtering Titanium Target

Titanium sputtering target is a high-purity titanium material. It is the “source” material in the physical vapor deposition (PVD) process. By being bombarded by high-energy particles, its atoms or molecules are sputtered out and deposited onto a substrate (such as a chip, glass, or tool), thereby forming a thin layer of titanium or titanium compound film.

2.Purity Grades Sputtering Titanium Target

The purity of titanium targets is typically expressed as a number of “9” (N) and is classified into different grades based on the application.

General Industrial Grade

· Purity: Typically below 99.9% (3N5).
· Applications: Applications requiring less stringent electrical performance requirements, such as decorative coatings (for watches, eyewear, etc.) and some tool coatings. These applications prioritize film hardness, color, and wear resistance and are less sensitive to trace impurities.

High Purity Titanium Target

• Purity: From 99.995% (4N5) to 99.999% (5N) and even higher.
• Application: This is the requirement of mainstream semiconductors, display panels, and other fields.
• 4N5: Commonly used in flat-panel displays and solar cells, which require high performance.
• 5N and above: Used in high-end semiconductor chip manufacturing, especially integrated circuits with advanced process technologies (such as those below 28nm), where it is required as a barrier layer or adhesion layer.

3.Main Application Areas

Titanium sputtering targets have a wide range of uses, primarily due to the excellent properties of the thin films they form or the compound films they produce after reactions.

1. Semiconductor Chip Manufacturing
   · Applications: Serves as conductive, barrier, and contact layers in integrated circuits. It is an essential material for the internal wiring of chips.
   · Requirements: Extremely high purity (typically above 99.995%), with extremely stringent requirements for internal microstructure and density.
2.  Flat Panel Displays and Touch Screens
   · Applications: Used in the manufacture of transparent conductive films (typically indium tin oxide, but titanium targets can serve as auxiliary layers) and metal electrodes in liquid crystal displays (LCDs), OLED displays, and touch screens.
3. Tool Coating
   Titanium nitride (TiN) or titanium carbonitride (TiCN) thin films are deposited through reactive sputtering in an atmosphere of nitrogen (N₂) or acetylene (C₂H₂).
   Function: This film is golden yellow and exhibits extremely high hardness, wear resistance, and a low coefficient of friction. It is widely used in cutting tools, molds, and the PVD-coated accessories you mentioned earlier, enhancing tool life and providing decorative effects.
4.  Architectural and Automotive Glass
   · Application: Used in the production of low-emissivity (Low-E) glass. This film reflects infrared rays while allowing visible light to pass through, achieving energy-saving benefits such as warmth in winter and coolness in summer.
5. Solar Cells
   · Application: Serves as an electrode or barrier layer in thin-film solar cells.
6. Decorative Coatings
   · Application: PVD coatings are used for mobile phone frames, watch cases, eyeglass frames, and other products. Available in a variety of colors (such as gold, black, and gunmetal) and enhancing surface wear and corrosion resistance.