Titanium targets play a crucial role in high-tech fields, particularly in thin-film deposition processes. These materials are primarily used to deposit thin films with specific functional or decorative effects onto substrates through magnetron sputtering or physical vapor deposition (PVD) techniques. Titanium targets are made of pure titanium or its alloys, with a specific shape and fine surface finish, and are used in physical evaporation or sputtering processes.
1.Titanium target processing
The melt-cast method uses vacuum melting technology to melt high-purity titanium raw material and then cast it into an ingot. After heat treatment and rolling or hammer forging, the ingot is processed by machine tools to produce the titanium target. This method requires simple equipment and a straightforward preparation process, but it must be carried out under strict vacuum or protective atmosphere.
2.Titanium Target Application Principles
Titanium targets are primarily produced using magnetron sputtering or PVD technologies. Magnetron sputtering utilizes a magnetic field to control the movement of particles in a gas, forming various functional thin films on substrates. PVD, an advanced coating production technology, is also applicable to the sputtering coating process for titanium targets. These technologies can form thin films with specific functional or decorative effects on surfaces, meeting the material performance requirements of various applications.
Applications Of Titanium Target
Titanium targets are widely used in electronics, for example, in the sputtering coating process for display screens in mobile phones, computers, and other electronic devices. In semiconductor manufacturing, titanium and its compounds (such as titanium nitride and titanium oxide) are often used to create interface layers, flux films, and barrier layers within semiconductor devices. In wafer fabrication, titanium targets are primarily used for metal sputtering, often using PVD processes. Furthermore, titanium targets are widely used in decorative coatings, such as those for glass and wheel hubs, as well as in the production of decorative coatings for jewelry, watches, eyeglass frames, knives, and home decor.
Titanium Target Purity
- Purity: From 99.995% (4N5) to 99.999% (5N) and even higher.
- Application: This is the requirement of mainstream semiconductors, display panels, and other fields.
- 4N5: Commonly used in flat-panel displays and solar cells, which require high performance.
- 5N and above: Used in high-end semiconductor chip manufacturing, especially integrated circuits with advanced process technologies (such as those below 28nm), where it is required as a barrier layer or adhesion layer.
